发明名称 |
CLICHE FOR OFFSET-PRINTING AND METHOD FOR MANUFACTURING SAME |
摘要 |
<p>The present invention relates to a cliché for offset printing and a method of manufacturing the same, and the cliché for offset printing according to the present invention comprises: a groove pattern, wherein a depth of at least a partial region of the groove pattern is different from a depth of a residual region. The present invention may comprise a double etching process when a cliché for offset printing is manufactured to control a bottom touch phenomenon that is a problem exhibited when a known wide line width is implemented, thus manufacturing the cliché for offset printing having various line widths and etching depths.</p> |
申请公布号 |
EP2762313(A4) |
申请公布日期 |
2015.07.15 |
申请号 |
EP20120836962 |
申请日期 |
2012.09.27 |
申请人 |
LG CHEM, LTD. |
发明人 |
HWANG, JI YOUNG;KOO, BEOM MO |
分类号 |
B41N1/00;B41C1/02;G02F1/1333 |
主分类号 |
B41N1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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