发明名称 CLICHE FOR OFFSET-PRINTING AND METHOD FOR MANUFACTURING SAME
摘要 <p>The present invention relates to a cliché for offset printing and a method of manufacturing the same, and the cliché for offset printing according to the present invention comprises: a groove pattern, wherein a depth of at least a partial region of the groove pattern is different from a depth of a residual region. The present invention may comprise a double etching process when a cliché for offset printing is manufactured to control a bottom touch phenomenon that is a problem exhibited when a known wide line width is implemented, thus manufacturing the cliché for offset printing having various line widths and etching depths.</p>
申请公布号 EP2762313(A4) 申请公布日期 2015.07.15
申请号 EP20120836962 申请日期 2012.09.27
申请人 LG CHEM, LTD. 发明人 HWANG, JI YOUNG;KOO, BEOM MO
分类号 B41N1/00;B41C1/02;G02F1/1333 主分类号 B41N1/00
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