CONTROL DEVICE FOR SUBSTRATE TREATMENT APPARATUS, SUBSTRATE TREATMENT APPARATUS, AND DISPLAY CONTROL DEVICE

摘要

Multiple functions of a substrate treatment apparatus are effectively executed. A control device (5) includes a plurality of application software [interface system APSW (510), control system APSW (520)] to execute the treatment for a CMP device′s every function, and a sharing memory (540) to store information used in the application software. The application software includes task monitoring application software (530) capable of monitoring whether an error is generated in the application software or not. The task monitoring application software (530) restarts the application software having the error and continues the treatment of the residual application software if the error is generated in one among the application software.