| 摘要 |
An exposure apparatus includes a pattern generator with light switches arrayed on a plane parallel to a surface of an object to be exposed. Each of the light switches has a switching element that is a rectangular pillar of an electro-optic crystal, and a pair of polarizers arranged on respective sides in the long axis direction of the switching element. The exposure apparatus drives the light switches individually to generate an exposure pattern having a certain bright and dark form and irradiate the object to be exposed with the pattern. Furthermore, the exposure apparatus has a plurality of microlenses provided on the light-output side of the pattern generator so that the optical axes of the microlenses are aligned to the longitudinal center axes of the switching elements, so as to project images of light-output ends of the switching elements at reduced size onto the object to be exposed. |
