Solid-state imaging device and method for manufacturing the same

摘要

A solid-state imaging device includes: a light-receiving pixel part configured to be formed on a semiconductor substrate; a black-level reference pixel part configured to be formed on the semiconductor substrate; and a multilayer interconnect part configured to be provided over the semiconductor substrate. The multilayer interconnect part includes an insulating layer formed over the semiconductor substrate and metal interconnect layers formed as a plurality of layers in the insulating layer. The multilayer interconnect part has a first light-blocking film formed above an area between first metal interconnects of a first metal interconnect layer as one of the metal interconnect layers above the black-level reference pixel part, and a second light-blocking film that is connected to the first light-blocking film and is formed of a second metal interconnect layer over the first metal interconnect layer.

主权项

1. A solid-state imaging device comprising:
a first metal interconnect layer between a substrate and a second metal interconnect layer, said second metal interconnect layer being between a first light-blocking film and said first metal interconnect layer; a second light-blocking film between said first light-blocking film and a third light-blocking film, said first light-blocking film and said third light-blocking film being in direct contact with said second light-blocking film, wherein said first metal interconnect layer is insulated from said substrate and said second metal interconnect layer, said second metal interconnect layer being insulated from said first light-blocking film and said second light blocking film; wherein said first light-blocking film is between said second light-blocking film and a black-level reference pixel part of the substrate; wherein a light-receiving pixel part the substrate is configured to receive incident light; wherein said third light-blocking film is between said second light-blocking film and a different metal interconnect layer, said different metal interconnect layer being insulated from said second light-blocking film and said third light-blocking film; wherein the first, second, and third blocking films are formed only in a single interlayer insulating film.