X-ray irradiation device and analysis device

摘要

[Object] The present invention provides an X-ray irradiation device capable of adjusting the energy of X-rays in a wide range, and an analysis device equipped with the X-ray irradiation device.;[Solving Means] An X-ray irradiation device according to an embodiment of the present invention focuses X-rays emitted from an X-ray generation mechanism to a predetermined focal position by a focusing mechanism. The X-ray generation mechanism has a structure which generates a plurality of X-rays having different wavelengths. The focusing mechanism has a structure in which the plurality of X-rays are focused to the same focal position by focusing elements having diffraction characteristics suitable for the wavelengths of the respective X-rays generated by the X-ray generation mechanism.

主权项

1. An X-ray irradiation device comprising:
a stage that supports a sample; an electron gun that emits an electron beam; an anode including:
a first anode element that generates a first X-ray having a first wavelength by being irradiated with the electron beam;a second anode element that generates a second X-ray having a second wavelength different from the first wavelength by being irradiated with the electron beam; anda support body that supports the first anode element and the second anode element; a first X-ray reflecting mirror having a diffraction characteristic suitable for the first wavelength, the first X-ray reflecting mirror configured to focus the first X-ray to a focal position on a sample supported by the stage; a second X-ray reflecting mirror having a diffraction characteristic suitable for the second wavelength, the second X-ray reflecting mirror configured to focus the second X-ray to the focal position; and a controller selectively switching between a first state where the first anode element is irradiated with the electron beam, and a second state where the second anode element is irradiated with the electron beam.