发明名称 Symmetrical inductively coupled plasma source with side RF feeds and RF distribution plates
摘要 A plasma reactor has an overhead multiple coil inductive plasma source with symmetric and radial RF feeds and cylindrical RF shielding around the symmetric and radial RF feeds. The radial RF feeds are symmetrically fed to the plasma source.
申请公布号 US9082590(B2) 申请公布日期 2015.07.14
申请号 US201313966614 申请日期 2013.08.14
申请人 APPLIED MATERIALS, INC. 发明人 Carducci James D.;Collins Kenneth S.;Fovell Richard;Kenney Jason A.;Ramaswamy Kartik;Rauf Shahid
分类号 H01J7/24;H05B31/26;H01J37/32;H05H1/46;C23C16/505 主分类号 H01J7/24
代理机构 代理人 Wallace Robert M.
主权项 1. A plasma reactor comprising: a window assembly; inner, middle and outer coil antennas adjacent said window assembly having a common axis; a current distribution ring adjacent and coupled to said middle coil antenna; a first conductive plate lying in a plane above said inner, middle and outer coil antennas, a first plurality of axial rods connected between a peripheral annular zone of said first conductive plate and said current distribution ring; a conductive ground plate in a plane between said first conductive plate and said current distribution ring; and a first radial conductive feed rod lying in a plane above said conductive ground plate and having an inner end coupled to a center of said first conductive plate and an outer end comprising a first RF feed terminal.
地址 Santa Clara CA US