发明名称 |
Hybrid impedance matching for inductively coupled plasma system |
摘要 |
In one aspect, a system includes a generator configured to generate and tune a frequency of a supply signal. The system includes an auto-matching network configured to receive the supply signal and to generate an impedance-matched signal for use in powering a plasma system. In some implementations, during a first stage of an impedance matching operation, the generator is configured to tune the frequency of the supply signal until the generator identifies a frequency for which the reactance of the generator and the reactance of the load are best matched. In some implementations, during a second stage of the impedance matching operation, the auto-matching network is configured to tune a tuning element within the auto-matching network until the auto-matching network identifies a tuning of the tuning element for which the resistance of the generator and the resistance of the load are best matched. |
申请公布号 |
US9082589(B2) |
申请公布日期 |
2015.07.14 |
申请号 |
US201213648183 |
申请日期 |
2012.10.09 |
申请人 |
Novellus Systems, Inc. |
发明人 |
Thomas George;Wongsenakhum Panya;Juarez Francisco J. |
分类号 |
H03H7/40;H01J37/32;H05H1/46 |
主分类号 |
H03H7/40 |
代理机构 |
Weaver Austin Villeneuve & Sampson LLP |
代理人 |
Weaver Austin Villeneuve & Sampson LLP |
主权项 |
1. A system comprising:
a generator configured to generate a supply signal and to tune a frequency of the supply signal within a tuning range; an auto-matching network configured to receive the supply signal and to generate an impedance-matched signal; and a plasma system that receives the impedance-matched signal, the impedance-matched signal supplying power to the plasma system for one or more plasma-facilitated processes, the impedance-matched signal being based on the supply signal as modified by the impedance of the plasma system and the impedance of the auto-matching network; wherein:
during a first stage of an impedance matching operation, the generator is configured to tune the frequency of the supply signal until the generator identifies a frequency for which the reactance of the generator and the reactance of the load on the generator are best matched for the tuning range; andduring a second stage of the impedance matching operation, the auto-matching network is configured to tune a tuning element within the auto-matching network until the auto-matching network identifies a tuning of the tuning element for which the resistance of the generator and the resistance of the load on the generator are best matched for the identified frequency. |
地址 |
Fremont CA US |