发明名称 |
Nonvolatile memory element and nonvolatile memory device |
摘要 |
A nonvolatile memory device includes: a first electrode; a second electrode; and a variable resistance layer which includes: a first oxide layer including a first metal oxide; a second oxide layer located between and in contact with the first oxide layer and a second electrode including a second metal oxide and having a degree of oxygen deficiency lower than a degree of oxygen deficiency of the first oxide layer; and a local region located in the first oxide layer and the second oxide layer, having contact with the second electrode and no contact with the first electrode, and having a degree of oxygen deficiency higher than the degree of oxygen deficiency of the second oxide layer and different from the degree of oxygen deficiency of the first oxide layer. |
申请公布号 |
US9082479(B2) |
申请公布日期 |
2015.07.14 |
申请号 |
US201213991787 |
申请日期 |
2012.10.03 |
申请人 |
PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. |
发明人 |
Wei Zhiqiang;Takagi Takeshi;Mitani Satoru;Muraoka Shunsaku;Katayama Koji |
分类号 |
G11C11/00;G11C13/00;H01L45/00;H01L27/24 |
主分类号 |
G11C11/00 |
代理机构 |
Wenderoth, Lind & Ponack, L.L.P. |
代理人 |
Wenderoth, Lind & Ponack, L.L.P. |
主权项 |
1. A variable resistance nonvolatile memory element comprising:
a first electrode; a second electrode; and a variable resistance layer interposed between the first electrode and the second electrode and capable of reversibly switching between a high resistance state and a low resistance state based on a polarity of a voltage applied between the first electrode and the second electrode, wherein the variable resistance layer includes: a first oxide layer comprising a first transition metal oxide; a second oxide layer located between and in contact with the first oxide layer and the second electrode, comprising a second transition metal oxide, and having a degree of oxygen deficiency lower than a degree of oxygen deficiency of the first oxide layer; and a local region located in the first oxide layer and the second oxide layer, having contact with the second electrode and no contact with the first electrode, and having a degree of oxygen deficiency higher than a degree of oxygen deficiency of the second oxide layer and different from the degree of oxygen deficiency of the first oxide layer. |
地址 |
Osaka JP |