Lithography apparatus having dual reticle edge masking assemblies and method of use

摘要

A lithography apparatus includes at least two reticle edge masking assemblies (REMAs). The lithography apparatus further includes a light source configured to emit a light beam having a wavelength and a beam separating element configured to divide the light beam into more than one collimated light beam. Each REMA is positioned to receive one of the more than one collimating light beams and each REMA comprises a movable slit for passing the one collimated light beam therethrough. The lithography apparatus further includes at least one mask having a pattern, where the at least one mask is configured to receive light from at least one of the REMA and a projection lens configured to receive light from the at least one mask. A method of using a lithography apparatus is also discussed.

主权项

1. A lithography apparatus comprising:
a beam separating element configured to divide a light beam from a light source into more than one collimated light beams; at least two reticle edge masking assemblies (REMAs), wherein each REMA is positioned to receive one of the more than one collimated light beams, and each REMA comprises a movable slit for passing the one collimated light beam therethrough,
wherein the movable slit is configured to move at a speed ranging from 400 mm/s to 700 mm/s; a controller for controlling the speed of the movable slit based on a size of the movable slit, an intensify of the one or more collimated light beams, or a material being patterned; one mask having a single pattern, wherein the mask is configured to receive light from all of the at least two REMAs; a projection lens configured to receive light transmitted by the one mask; and an immersion liquid adjacent to the projection lens.