发明名称 Semiconductor devices and power conversion systems
摘要 A semiconductor device includes first semiconductor layer of a first conductivity type; a second semiconductor layer of a second conductivity type that is formed near a surface of the first semiconductor layer; a first main electrode that is electrically connected to the second semiconductor layer; a third semiconductor layer of the second conductivity type that neighbors the first semiconductor layer; a fourth semiconductor layer of the first conductivity type that is selectively disposed in an upper portion of the third semiconductor layer; a second main electrode that is electrically connected to the third semiconductor layer and the fourth semiconductor layer; a trench whose side face is in contact with the third semiconductor layer and the fourth semiconductor layer; a gate electrode that is formed along the side face of the trench by a sidewall of polysilicon; and a polysilicon electrode.
申请公布号 US9082814(B2) 申请公布日期 2015.07.14
申请号 US201213348021 申请日期 2012.01.11
申请人 Hitachi Power Semiconductor Device, Ltd. 发明人 Shiraishi Masaki;Mori Mutsuhiro;Suzuki Hiroshi;Watanabe So
分类号 H01L29/40;H01L29/423;H01L29/66;H01L29/739;H01L29/06;H01L29/10 主分类号 H01L29/40
代理机构 Crowell & Moring LLP 代理人 Crowell & Moring LLP
主权项 1. A semiconductor device, comprising: a first semiconductor layer of a first conductivity type; a second semiconductor layer of a second conductivity type that is formed near a surface of the first semiconductor layer; a first main electrode that is electrically connected to the second semiconductor layer; a third semiconductor layer of the second conductivity type that neighbors the first semiconductor layer and is formed near a surface of the first semiconductor layer opposite to the second semiconductor layer; a fourth semiconductor layer of the first conductivity type that is selectively disposed in an upper portion of the third semiconductor layer; a second main electrode that is electrically connected to the third semiconductor layer and the fourth semiconductor layer; a trench whose side face is in contact with the third semiconductor layer and the fourth semiconductor layer, while reaching the first semiconductor layer; a gate electrode that is formed by a sidewall of polysilicon along the side face of the trench; and a polysilicon electrode that is disposed away from the gate electrode within the trench and electrically connected to the second main electrode.
地址 Hitachi-shi JP
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