Optical system of microlithographic projection exposure apparatus and method of correcting wavefront deformation in same

摘要

An optical system of a microlithographic projection exposure apparatus includes a wavefront correction device which has a plurality of fluid outlet apertures. The apertures are arranged so that fluid flows emerging from the outlet apertures enter a space through which projection light propagates during operation of the apparatus. A temperature controller sets the temperature of the fluid flows individually for each fluid flow. The temperature distribution is determined such that optical path length differences caused by the temperature distribution correct wavefront deformations.

主权项

1. An optical system, comprising:
a plurality of optical elements; and a wavefront correction device configured so that a gas flowing through the wavefront correction device emerges from the wavefront correction device via gas outlet apertures to provide gas flows which enter a space through which projection light propagates during operation of the optical system, the wavefront correction device comprising a temperature controller configured to set a temperature of each individual gas flow so that, taken as a whole, the gas flows do not affect a heat balance of the optical system, wherein the outlet apertures are configured so that none of the gas flows impinges on any of the optical elements, and the optical system is configured to be used in a microlithographic projection exposure apparatus.