| 主权项 |
1. A resist stripping solution composition, comprising (a) a basic compound including one or more selected from among compounds represented by Formulas 1 to 3 below, (b) an amide compound represented by Formula 4 below, (c) a polar solvent, and (d) a polyol compound represented by Formula 5 below: wherein R1, R2, R3, R4, R5 and R6 are each independently hydrogen, a C1˜10 alkyl group substituted or unsubstituted with amino, a C2˜10 alkenyl group, a C1˜10 hydroxyalkyl group, a carboxylic group, a C1˜10 alkyl group substituted with C1˜10 alkoxy substituted or unsubstituted with hydroxyl, an amino group substituted or unsubstituted with C1˜4 alkyl, a phenyl group, or a benzyl group; wherein R7, R8 and R9 are each independently hydrogen, a C1˜5 alkyl group, a C2˜5 alkenyl group, a C1˜10 hydroxyalkyl group, a carboxylic group, a C1˜5 alkyl group substituted with C1˜10 alkoxy, or an amino group substituted or unsubstituted with C1˜4 alkyl; and wherein R10 and R11 are each independently a C1˜10 alkylene group, a C2˜10 alkenylene group, a C1˜10 hydroxyalkylene group, a C1˜10 alkylene group substituted with C1˜10 alkoxy, or a bond, wherein, based on a total weight of the resist stripping composition, the resist stripping solution composition includes, (a) 5˜30 wt % of the basic compound including one or more compounds represent by Formulas 1 to 3, (b) 20˜80 wt % of the amide compound represented by Formula 4, (c) 10˜70 wt % of the polar solvent, and (d) 0.05˜20 wt % of the polyol compound represented by Formula 5. |
