发明名称 Method of fabricating a power semiconductor chip package
摘要 A device includes a vertical power semiconductor chip having an epitaxial layer and a bulk semiconductor layer. A first contact pad is arranged on a first main face of the power semiconductor chip and a second contact pad is arranged on a second main face of the power semiconductor chip opposite to the first main face. The device further comprises an electrically conducting carrier attached to the second contact pad.
申请公布号 US9082878(B2) 申请公布日期 2015.07.14
申请号 US201313935457 申请日期 2013.07.03
申请人 Infineon Technologies AG 发明人 Otremba Ralf
分类号 H01L23/52;H01L21/336;H01L23/00;H01L23/495;H01L29/40;H01L29/06;H01L29/10;H01L29/417;H01L29/45;H01L29/78 主分类号 H01L23/52
代理机构 Slater & Matsil, L.L.P. 代理人 Slater & Matsil, L.L.P.
主权项 1. A method of manufacturing a device, the method comprising: forming a first contact pad on a first main face of a semiconductor chip, the semiconductor chip comprising an epitaxial layer and a bulk semiconductor layer; and mounting the semiconductor chip with the first contact pad via a connecting layer on an electrically conducting carrier, wherein a ratio of a thickness of the electrically conducting carrier and a sum of a thickness of the semiconductor chip, a thickness of the first contact pad and a thickness of the connecting layer is equal or greater than 3.
地址 Neubiberg DE
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