发明名称 |
Method of fabricating a power semiconductor chip package |
摘要 |
A device includes a vertical power semiconductor chip having an epitaxial layer and a bulk semiconductor layer. A first contact pad is arranged on a first main face of the power semiconductor chip and a second contact pad is arranged on a second main face of the power semiconductor chip opposite to the first main face. The device further comprises an electrically conducting carrier attached to the second contact pad. |
申请公布号 |
US9082878(B2) |
申请公布日期 |
2015.07.14 |
申请号 |
US201313935457 |
申请日期 |
2013.07.03 |
申请人 |
Infineon Technologies AG |
发明人 |
Otremba Ralf |
分类号 |
H01L23/52;H01L21/336;H01L23/00;H01L23/495;H01L29/40;H01L29/06;H01L29/10;H01L29/417;H01L29/45;H01L29/78 |
主分类号 |
H01L23/52 |
代理机构 |
Slater & Matsil, L.L.P. |
代理人 |
Slater & Matsil, L.L.P. |
主权项 |
1. A method of manufacturing a device, the method comprising:
forming a first contact pad on a first main face of a semiconductor chip, the semiconductor chip comprising an epitaxial layer and a bulk semiconductor layer; and mounting the semiconductor chip with the first contact pad via a connecting layer on an electrically conducting carrier, wherein a ratio of a thickness of the electrically conducting carrier and a sum of a thickness of the semiconductor chip, a thickness of the first contact pad and a thickness of the connecting layer is equal or greater than 3. |
地址 |
Neubiberg DE |