| 发明名称 | Substrate having low reflection and high contact angle, and production method for same | ||
| 摘要 | Provided are a substrate including a base with a pattern on at least one side thereof, in which a refractive index in a lower region of the pattern and a refractive index in an upper region of the pattern are different from each other according to a shape of the pattern; and a water repellent coating layer provided on at least one side with the pattern of the base, an optical product including the same, and a manufacturing method of the substrate. The substrate according to the present invention has both an excellent anti-reflective property and an excellent water repellent property. | ||
| 申请公布号 | US9081134(B2) | 申请公布日期 | 2015.07.14 |
| 申请号 | US201013504444 | 申请日期 | 2010.10.28 |
| 申请人 | LG CHEM, LTD. | 发明人 | Kim Tae-Su;Kim Jae-Jin;Shin Bu-Gon;Hong Young-Jun;Choi Hyeon |
| 分类号 | G02B5/30;G02B1/118;G02B1/10 | 主分类号 | G02B5/30 |
| 代理机构 | McKenna Long & Aldridge LLP | 代理人 | McKenna Long & Aldridge LLP |
| 主权项 | 1. A substrate, comprising: a base with a pattern on at least one side thereof, in which a refractive index in a lower region of the pattern and a refractive index in an upper region of the pattern are different from each other according to a shape of the pattern; and a water repellent coating layer provided on the at least one side with the pattern of the base, wherein the pattern on the base is directly formed by an interference lithography method, and wherein the substrate is for a polarizer compensation film for a liquid crystal display, or an anti-contamination film for a touch screen. | ||
| 地址 | Seoul KR | ||