DEVICE AND METHOD FOR DEPOSITION OF ATOMIC PLIES

摘要

FIELD: process engineering.SUBSTANCE: invention relates to application of atomic ply on substrate sheet-like surface. This device comprises injector head with precipitation chamber provided with precursor inlet and outlet. Said precursor inlet and outlet create gaseous precursor flow from precursor inlet via precipitation chamber to precursor outlet. Precipitation chamber is confined by injector head and substrate surface. Basic gas injector forces said gas between injector head and substrate surface. Basic gas creates gas cushion. Conveyor system is used to displace said substrate and injector head along substrate plane for shape the substrate transportation plane. Basic part is located opposite said injector head. Basic part is configured to create gas cushion with pressure profile to balance injector head gas cushion in transportation plane so that said substrate is supported by said gas cushion between injector head and basic part.EFFECT: deposition of atomic plies on sheet-like substrate.15 cl, 10 dwg