METHOD OF PRODUCING HYDROPHOBIC OR HYDROPHILIC POROUS SILICON

摘要

FIELD: chemistry.SUBSTANCE: method includes treating the surface of crystalline silicon by electrochemical etching in hydrofluoric acid solution with concentration of 20-30% while supplying current with surface density of 750-1000 mA/cmfor 5-30 s to obtain hydrophobic silicon or supplying current with surface density of not more than 650 mA/cmfor 5-30 s to obtain hydrophilic silicon.EFFECT: method enables to obtain a surface with multimodal nano- or microporosity in a single step.4 dwg