发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To enable improvement in throughput.SOLUTION: A substrate processing apparatus according to an embodiment comprises a plurality of processing units and a plurality of substrate transfer devices. The plurality of processing units are arranged side by side in a vertical direction, for processing a substrate. The substrate transfer devices are movable in the vertical direction and carries in/out the substrate to/from the processing units. In addition, the substrate transfer devices are arranged side by side in a vertical direction and a movable range in a vertical direction overlaps each other and includes a first transfer arm and a second transfer arm, which independently move to a vertical direction.
申请公布号 JP2015128102(A) 申请公布日期 2015.07.09
申请号 JP20130273035 申请日期 2013.12.27
申请人 TOKYO ELECTRON LTD 发明人 MORIKAWA KATSUHIRO;UEDA KAZUNARI;MURATA AKIRA;MINAMIDA JUNYA
分类号 H01L21/677 主分类号 H01L21/677
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