IMPRINT APPARATUS, IMPRINT METHOD AND METHOD OF MANUFACTURING AN ARTICLE

摘要

The present invention provides an imprint apparatus including a control unit configured to perform detection process, wherein the detection process includes first process in which a detection optical system is caused to detect a mold-side mark in a state in which a substrate state is positioned such that a reference mark is located outside the field of view of the detection optical system, and second process in which the detection optical system is caused to detect the reference mark in a state in which the mold stage is positioned such that the mold-side mark is out of focus with respect to the detection optical system, and the substrate stage is positioned such that the reference mark is located inside the field of view of the detection optical system.

主权项

1. An imprint apparatus that performs imprint process for forming a pattern on an imprint material on a substrate using a mold, the imprint apparatus comprising:
a mold stage configured to hold the mold; a substrate stage configured to hold the substrate; a detection optical system configured to detect a mold-side mark provided on the mold and a reference mark arranged on the substrate stage; a control unit configured to perform detection process by controlling positioning of the mold stage and the substrate stage and detection performed by the detection optical system; and a processing unit configured to perform the imprint process based on a detection result from the detection optical system, wherein the detection process includes first detection process in which the detection optical system is caused to detect the mold-side mark in a state in which the substrate stage is positioned such that the reference mark is located outside the field of view of the detection optical system, and second detection process in which the detection optical system is caused to detect the reference mark in a state in which the mold stage is positioned such that the mold-side mark is out of focus with respect to the detection optical system, and the substrate stage is positioned such that the reference mark is located inside the field of view of the detection optical system.