| 摘要 |
<p>A polishing pad and preparation method thereof, the polishing pad comprising more than two grooves (5), a polyurethane base material (1), a polyurethane fiber substrate (2), a polyurethane-ethylene adhesive PSA-A layer (3) and PSA-B layer (4); the grooves (5) are uniformly arranged on one surface of the polyurethane base material (1); the other surface of the polyurethane base material (1) adheres to one surface of the polyurethane fiber substrate (2) via the polyurethane-ethylene adhesive PSA-A layer (3); the other surface of the polyurethane fiber substrate (2) is connected to the polyurethane-ethylene adhesive PSA-B layer (4); and ultra-short polyester fiber and ultra-short aramid fiber are added to the polyurethane base material (1). The polishing pad exhibits high polishing speed, evenness and long service life in chemical mechanical polishing.</p> |
