| 摘要 |
<p>The present invention relates to a load lock chamber for a substrate processing apparatus, including: a chamber body having an inlet and an outlet to allow the access of substrates; a chamber lid joined to the top of the chamber body to be sealed; and a first damper formed in an area on the chamber lid to come in contact with the chamber body to prevent particles caused by friction. Therefore, the load lock chamber for a substrate processing apparatus allows the quiet processing of substrates without causing unnecessary line maintenance costs by preventing damage to a chamber caused by metal particles; and prevents damage to substrates coming into or out of the chamber as no metal particles are produced.</p> |
