| 摘要 |
The present invention concerns a method of selective chemical etching of a glass sheet, using a mask, making it possible to limit the etching of the glass under the edges of the mask, and to obtain a glass sheet selectively etched with patterns which can be very small and of which the contours exhibit a high level of sharpness. In particular, the invention concerns a method for producing a selectively etched glass sheet, comprising (i) a masking step which comprises selectively depositing a crosslinkable organic liquid composition on one of the faces of the sheet, using at least one ink-jet head, and the cross-linking of said composition by exposure to ultraviolet radiation; (ii) an etching step during which the areas of said face which are not covered by the crosslinked composition are chemically etched; and (iii) a finishing step which comprises removing said crosslinked composition. |
