发明名称 COMPOSITION FOR FORMING CONDUCTIVE PATTERN AND RESIN STRUCTURE HAVING CONDUCTIVE PATTERN
摘要 The present invention relates to a composition for forming a conductive pattern, which allows a conductive micropattern to be formed on various polymer resin products or resin layers by a simplified process and can effectively satisfy a demand in the art, for example, for realizing various colors, and to a resin structure having a conductive pattern. The composition for forming a conductive pattern comprises: a polymer resin; and a non-conductive metallic compound of a three-dimensional NASICON structure having a predetermined chemical structure, the non-conductive metallic compound comprising a first metal and a second metal. The composition for forming a conductive may be a composition for forming a conductive pattern by irradiation of electromagnetic waves, in which a metallic core comprising the first metal or an ion thereof is formed from the non-conductive metallic compound by irradiation of electromagnetic waves.
申请公布号 WO2015102270(A1) 申请公布日期 2015.07.09
申请号 WO2014KR12487 申请日期 2014.12.17
申请人 LG CHEM, LTD. 发明人 JEONG, HAN NAH;PARK, CHEOL-HEE;JUNG, SANG YUN;KIM, JAE JIN;PARK, CHEE-SUNG;KIM, JAE HYUN;JUN, SHIN HEE
分类号 H01B1/20;H01B5/00 主分类号 H01B1/20
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