APPARATUS FOR WET ETCHING

摘要

Disclosed is a wet etching device enabling high quality etching while occupying a small space with a simple configuration. According to an embodiment of the present invention, the device includes a chamber in which etching is performed and an inner space to store an etching solution is placed; a spray part placed in an upper part of the chamber to spray the etching solution to a product; a product fixing part placed in the chamber to fix the product; a rotating unit rotating the product fixing part; a support part supporting the chamber in an upper part of the chamber; an etching solution circulating part circulating the etching solution to spray the etching solution stored in the chamber through a spray nozzle; an elevating part elevating the product fixing part; and an angle control part controlling a spray angle of the spray nozzle.