| 发明名称 |
Exposure Apparatus And Exposure Method Thereof |
| 摘要 |
An exposure apparatus includes at least one radiation source, a plurality of projection lenses, and a lens switch. The radiation source is operable for providing a radiation beam. The lens switch is operable for selecting one of the projection lenses to focus the radiation beam to a target plane. |
| 申请公布号 |
US2015192857(A1) |
申请公布日期 |
2015.07.09 |
| 申请号 |
US201414150951 |
申请日期 |
2014.01.09 |
| 申请人 |
Taiwan Semiconductor Manufacturing CO., LTD. |
发明人 |
Yen Wen-Yen;Liao Yen-Chen;Chen Chien-Li |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An exposure apparatus, comprising:
at least one radiation source operable for providing a radiation beam; a plurality of projection lenses; and a lens switch operable for selecting one of the projection lenses to focus the radiation beam to a target plane. |
| 地址 |
Hsinchu TW |
