APPARATUS AND METHOD FOR CALIBRATING EXTREME ULTRAVIOLET SPECTROMETER

摘要

Provided are an apparatus and method for calibrating an extreme ultraviolet (EUV) spectrometer in which a wavelength of a spectrum of EUV light used for EUV lithography and mask inspection technology can be measured accurately.

主权项

1. An apparatus for calibrating an extreme ultraviolet (EUV) spectrometer, comprising:
an EUV generation module including a means for generating EUV light by an interaction of laser light and an inert gas in a vacuum chamber and a zirconium (Zr) filter configured to transmit a wavelength of a specific band and block a wavelength band of a femtosecond laser among wavelengths of the generated EUV light; and an EUV spectrometer calibration unit including an optical module having at least one mirror to reflect only a wavelength of a specific band among wavelengths of EUV light transmitted from the Zr filter of the EUV generation module, a diffraction grating configured to separate a wavelength of a specific band of the EUV light reflected from the mirror of the optical module based on wavelengths, a charge-coupled device (CCD) camera configured to capture the EUV light having the wavelength of the specific band separated from the diffraction grating, and a spectrum conversion module configured to convert a pixel of an image captured from the CCD camera into a wavelength so as to obtain a spectrum according to a harmonic generation order of the EUV light.