发明名称 |
METHOD AND APPARATUS FOR DESIGN OF A METROLOGY TARGET |
摘要 |
<p>A method of metrology target design is described. The method includes determining a sensitivity of a parameter of a metrology target design to a perturbation of a process parameter for forming, or measuring the formation of, the metrology target, and determining a robustness of the metrology target design based on the sum of the sensitivity multiplied by the perturbation of at least one of the process parameters.</p> |
申请公布号 |
WO2015101460(A1) |
申请公布日期 |
2015.07.09 |
申请号 |
WO2014EP76544 |
申请日期 |
2014.12.04 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
CHEN, GUANGQING;LIU, WEI;VAN DER SCHAAR, MAURITS |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|