PIXEL SUBSTRATE AND FABRICATION METHOD THEREOF

摘要

A pixel substrate and a fabrication method thereof are provided. The method includes: forming a gate and a lower pad on a substrate; forming a gate insulating layer overlaying the gate and the lower pad; forming a channel layer and a first electrode layer on the gate insulating layer, in which the projection areas of the channel layer and the gate on the substrate are overlapped; forming an etching-barrier material layer on the substrate and simultaneously forming a contact opening at the gate insulating layer to expose the lower pad; forming a source, a drain and an upper pad on the substrate; forming a protective layer; forming a second electrode layer with multiple slits on the protective layer, in which one of the first and second electrode layers is electrically connected to the drain. The invention can simplify the process steps and reduce fabrication time.

主权项

1. A fabrication method of a pixel substrate, comprising:
forming a channel layer and a first electrode layer on an insulating layer, wherein both the channel layer and the first electrode layer are located in a pixel region of a substrate; forming an etching-barrier material layer on the substrate to entirely overlay the channel layer, the first electrode layer and the insulating layer; performing an etching step for patterning the etching-barrier material layer to form an etching-barrier pattern layer having a first contact opening exposing a non-shielded portion of the insulating layer, wherein subsequent to forming the etching-barrier pattern layer, the etching step further removes the non-shielded portion of the insulating layer to form a second contact opening at the insulating layer; forming a source, a drain and an upper pad; forming a protective layer on the substrate to overlay the source, the drain and the upper pad; and forming a second electrode layer on the protective layer, wherein the second electrode layer is located in the pixel region and has a plurality of slits, and the projection area of the second electrode layer on the substrate and the projection area of the first electrode layer on the substrate are overlapped with each other.