| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an imprint method capable of suppressing increase of a separating force between a mold and a resin on a substrate while enhancing productivity. <P>SOLUTION: The imprint method forms a pattern in a region to be processed in a plurality of regions to be processed on a substrate by molding and curing an imprint material with a mold 7a on which a plurality of pattern regions P1 to P4 are formed. While at least one of the mold 7a and the substrate is being deformed, the mold 7a and an imprint material are mutually separated at the plurality of pattern regions P1 to P4 in different timings, respectively. <P>COPYRIGHT: (C)2013,JPO&INPIT</p> |
