Disclosed is a ceramic substrate firing apparatus. Provided is the ceramic substrate firing apparatus, which comprises: a firing furnace for supplying heat to a ceramic substrate by accommodating a plurality of ceramic substrates therein; a plurality of setters installed as spaced in a vertical direction inside the firing furnace to support a lower surface of the ceramic substrate; a pillar for supporting the setters to maintain the interval between the setters; and a gas input unit formed in the firing furnace to supply a reducing gas to the firing furnace wherein a plurality of through-holes are formed on the pillar so that the reducing gas passes through.
