| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of compensating an exposure image which improves the exposure accuracy of a conductor circuit.SOLUTION: A method of compensating an exposure image comprises compensating an original exposure image by a plurality of etching factors, forming a patterned photoresist layer on the basis of the compensated exposure image and patterning a conductor layer on a circuit board by wet etching using the patterned photoresist layer to form a conductor circuit. Errors of line widths of the measured conductor circuit are expressed as made-up results of not yet considered etching factors. When measured line widths exceed a preliminarily set range, effects of not yet considered factors on the etching results are induced, and error values are calculated. After incorporating the error values, compensation data for individual corresponding points on the circuit board of the conductive layer are calculated anew, and a patterned photoresist layer and a corresponding conductor circuit are formed again on the basis of compensated data. |
