SYSTEMS AND METHODS OF USE OF A SILICON-CONTAINING DOPANT COMPOSITIONS FOR IMPROVING ION BEAM CURRENT AND PERFORMANCE DURING SILICON ION IMPLANTATION,申请号EP20130762931-传众专利搜索

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发明名称	SYSTEMS AND METHODS OF USE OF A SILICON-CONTAINING DOPANT COMPOSITIONS FOR IMPROVING ION BEAM CURRENT AND PERFORMANCE DURING SILICON ION IMPLANTATION
摘要
申请公布号	EP2891172(A1)	申请公布日期	2015.07.08
申请号	EP20130762931	申请日期	2013.08.28
申请人	PRAXAIR TECHNOLOGY INC.	发明人	SINHA, ASHWINI, K.;BROWN, LLOYD, ANTHONY;CAMPEAU, SERGE, MARIUS
分类号	H01J37/317;H01J37/08	主分类号	H01J37/317
代理机构		代理人
主权项
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