RETREATMENT METHOD FOR WAFER BACKGRINDING SILICON WASTES

摘要

The present invention relates to a retreatment method of wafer backgrinding silicon waste, which is effectively applicable throughout the industry required for a silicon material such as a lithium ion secondary battery, as highly purifying waste silicon sludge generated during backgrinding wafer in a simple and economic manner. According to the present invention, provided is a retreatment method of wafer backgrinding silicon waste, which comprises: a solid dispersion step for dispersing waste silicon sludge in a solvent; a solid and liquid separating step for separating waste silicon sludge dispersed in the solvent into solid and liquid; and a drying step for drying solid treated in the high purification step.