UNIT FOR SUPPLYING CHEMICAL

摘要

The present invention is to provide a device for supplying processing liquid to a substrate and a method thereof. A processing liquid supplying unit comprises: a nozzle; a processing liquid supplying line to connect a processing tank and the nozzle to supply a processing liquid provided to the processing tank to the nozzle; and a flow rate control member to control the flow rate of the processing liquid so the flow rate of the processing liquid corresponds to a predetermined flow rate value by being installed on the processing liquid supplying line. The flow rate control member comprises: a temperature measuring sensor to measure the temperature of the processing liquid; a flow rate control valve to control the flow rate of the processing liquid; and a controller to control the opening ratio of the flow rate control valve. The controller provides different opening ratios for each temperature measuring value provided from the temperature measuring sensor. Accordingly, it is controlled that the supply flow rate corresponds to a predetermined flow rate because more flow rates are supplied than a measured flow rate of the processing liquid when a light temperature processing liquid is used.