薄膜堆積のためのニオブおよびバナジウムの有機金属前駆体

摘要

Compounds of the formula Cp(R 1 ) m M(NR 2 2 ) 2 (=NR 3 ) (I):
Wherein:
M is a metal independently selected from Vanadium (V) or Niobium (Nb) and m ‰¤ 5;
R 1 is an organic ligand, each one independently selected in the group consisting of H, linear or branched hydrocarbyl radical comprising from 1 to 6 carbon atom;
R 2 is an organic ligand, each one independently selected in the group consisting of H, linear or branched hydrocarbyl radical comprising from 1 to 6 carbon atom;
R 3 is an organic ligand selected in the group consisting of H, linear or branched hydrocarbyl radical comprising from 1 to 6 carbon atom.
The compounds are used as metal precursors for ALD and CVD processes.