PHOTOLITHOGRAPHIC METHODS

摘要

Disclosed is a method for forming an electronic device sequentially comprising the steps of: (a) providing a semiconductor substrate including one or more layer going to be patterned; (b) forming a photoresist layer formed with a composition including a matrix polymer including a unit having acid-unstable group, a photoacid generating agent, and an organic solvent; (c) coating an overcoat composition including a quanching polymer and an organic solvent including a unit having a base portion effect to neutralizing acid generated by the photoacid generating agent on a surface area of the photoresist layer; (d) exposing the photoresist layer to an activation radiating beam; (e) heating the substrate in a baking process after exposure; and (f) developing the exposed film with an organic solvent developing agent.