发明名称 フルオロスルホニルイミド塩およびフルオロスルホニルイミド塩の製造方法
摘要 <p>The present invention provides a method for producing a fluorisulfonylimide salt, which enables reducing the impurity content and continuous operation for a long time, and a fluorosulfonyl imide salt. The fluorosulfonyl imide salt of the present invention has a K content of 10,000 ppm or less. The method for producing a fluorosulfonyl imide salt of the present invention is that after a fluorination reaction of chlorosulfonyl imde or a salt thereof, the reaction solution is brought into contact with an aqueous alkaline solution so as to remove impurities. The fluorosulfonyl imide salt of the present invention, in which various impirities are reduced to extremely low levels, is useful as an electrolyte used in a lithium secondary battery, a capacitor or the like, an ionic liquid, or an intermediate for a sulfonyl imide salt, and the like. It is expected that use of the fluorosulfonyl imide salt of the present invention as an electrolyte leads to a high-performance electrochemical device.</p>
申请公布号 JP5744779(B2) 申请公布日期 2015.07.08
申请号 JP20120062730 申请日期 2012.03.19
申请人 发明人
分类号 C01B21/086 主分类号 C01B21/086
代理机构 代理人
主权项
地址