发明名称 |
METAL OXIDE SEMICONDUCTOR FIELD EFFECT TRANSISTOR AND THE METHOD |
摘要 |
<p>An embodiment of the present invention relates to a metal oxide semiconductor field effect transistor and a method thereof. A metal oxide semiconductor field effect transistor according to the embodiment of the present invention includes a first semiconductor layer; a gate electrode arranged on the first semiconductor layer; a spacer arranged on one side and the other side of the gate electrode; and a source electrode and a drain electrode which are arranged on one side and the other side of the first semiconductor layer and are separated from each other. The width of the first semiconductor layer is larger than that of the gate electrode.</p> |
申请公布号 |
KR20150077800(A) |
申请公布日期 |
2015.07.08 |
申请号 |
KR20130166652 |
申请日期 |
2013.12.30 |
申请人 |
KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY |
发明人 |
CHOI, YANG KYU;JEON, CHANG HOON |
分类号 |
H01L29/78;H01L21/336;H01L29/778 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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