发明名称 APPARATUS AND METHOD FOR TREATING SUBSTRATE
摘要 <p>The present invention relates to an apparatus and a method for processing substrates to allow the discharge of static electricity induced by the transfer of substrates. According to an embodiment of the present invention, the apparatus for processing substrates includes: a plurality of rotatable transfer shafts provided side by side in the transfer direction of substrates, wherein a plurality of rollers coming in contact with the bottom of substrates is joined and fixated to the plurality of transfer shafts; a bearing holder installed on a frame placed at one end of the transfer shafts, wherein a bearing joined to one end of the transfer shafts is inserted in the bearing holder; a grounding part placed inside the bearing holder, wherein the top of the grounding part is curved toward the center of the bearing to come in contact with both sides of the bearing; a grounding unit having a bottleneck-shaped bottom and a grounding line placed below the bearing holder; and a current carrying hole provided at the bottom of the bearing holder below the grounding line.</p>
申请公布号 KR20150077726(A) 申请公布日期 2015.07.08
申请号 KR20130166496 申请日期 2013.12.30
申请人 SEMES CO., LTD. 发明人 LEE, HAK SUN
分类号 H01L21/677;B65G39/12;B65G49/06 主分类号 H01L21/677
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