发明名称 Method for forming deposition film, and method for producing display device
摘要 A masking film (13) is formed so as to have an opening in a display region (R1) (luminescent region) and a sealing region. Subsequently, luminescent layers (8R, 8G, and 8B) having a stripe pattern are formed. Then, the masking film (13) is peeled off, so that the luminescent layers (8R, 8G, and 8B) patterned with high resolution are provided.
申请公布号 US9076989(B2) 申请公布日期 2015.07.07
申请号 US201113976422 申请日期 2011.12.20
申请人 Sharp Kabushiki Kaisha 发明人 Sonoda Tohru;Kawato Shinichi;Inoue Satoshi;Hashimoto Satoshi
分类号 H01L51/56;H05B33/04;H05B33/10;H01L21/02;H01L51/00;C23C14/04;C23C16/04;H01L27/32 主分类号 H01L51/56
代理机构 Morrison & Foerster LLP 代理人 Morrison & Foerster LLP
主权项 1. A method for forming a vapor-deposited film on a substrate, comprising the steps of: forming, in a predetermined region of the substrate, a shielding film that can be peeled off; forming a vapor-deposited film on the substrate via the shielding film; forming the vapor-deposited film into a predetermined shape by peeling off the shielding film; and forming, by use of a vapor deposition mask having a through-hole, a second film which is different from the vapor-deposited film, the step of forming the second film being carried out before, after, or before and after the step of forming the vapor-deposited film on the substrate, the shielding film having an opening that corresponds to a region on the substrate other than the predetermined region, the through-hole being smaller than the opening of the shielding film, and the second film and the vapor-deposited film overlapping each other in the opening of the shielding film when viewed from above, the peeling off of the shielding film being carried out after the step of forming the second film, wherein the second film formed on a surface of the shielding film and the vapor-deposited film formed on the surface of the shielding film are peeled off together.
地址 Osaka JP