发明名称 High electron mobility transistor
摘要 According to example embodiments, a high electron mobility transistor includes: a channel layer including a 2-dimensional electron gas (2DEG); a contact layer on the channel layer; a channel supply layer on the contact layer; a gate electrode on a portion of the channel layer; and source and drain electrodes on at least one of the channel layer, the contact layer, and the channel supply layer. The contact layer is configured to form an ohmic contact on the channel layer. The contact layer is n-type doped and contains a Group III-V compound semiconductor. The source electrode and the drain electrode are spaced apart from opposite sides of the gate electrode.
申请公布号 US9076850(B2) 申请公布日期 2015.07.07
申请号 US201313953165 申请日期 2013.07.29
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 Hwang In-jun;Choi Hyo-ji;Kim Jong-seob;Oh Jae-joon
分类号 H01L29/66;H01L29/778;H01L29/36;H01L29/423;H01L29/06;H01L29/20 主分类号 H01L29/66
代理机构 Harness, Dickey & Pierce, PLLC 代理人 Harness, Dickey & Pierce, PLLC
主权项 1. A high electron mobility transistor (HEMT) comprising: a channel layer comprising a 2-dimensional electron gas (2DEG); a contact layer on the channel layer, the contact layer configured to form an ohmic contact on the channel layer,the contact layer being n-type doped, andthe contact layer containing a Group III-V compound semiconductor; a channel supply layer on the contact layer; a gate electrode on a portion of the channel layer; and a source electrode and a drain electrode on at least one of the channel layer, the contact layer, and the channel supply layer, the source electrode and the drain electrode being spaced apart from opposite sides of the gate electrode.
地址 Gyeonggi-Do KR