发明名称 POLISHING END POINT DETECTION METHOD AND POLISHING END POINT DETECTION APPARATUS
摘要 <p>The subject of the present invention is to improve the detection accuracy of a polishing end point. A polishing end point detection method polishes a polishing target including a mixed film of a nanocarbon material and a light transmission material, and projects light to the polishing target at the same time (step S102). And then, the polishing end point detection method receives the light reflected from the polishing target (step S103). After that, the polishing end point detection method executes signal processing to the reflected light which is received (step S104). And then, the polishing end point detection method determines the polishing end point based on the result of the signal processing (step S105) and the polishing end point is detected (step S106).</p>
申请公布号 KR20150077337(A) 申请公布日期 2015.07.07
申请号 KR20140186984 申请日期 2014.12.23
申请人 EBARA CORPORATION 发明人 ITO BAN;SAKUMA NAOSHI;KAJITA AKIHIRO;SAKAI TADASHI
分类号 H01L21/304;H01L21/66 主分类号 H01L21/304
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