| 摘要 |
<p>The present invention aims to provide: a phase shift mask blank that enables a phase shift film with a cross-section in the shape capable of providing a phase shift effect enough by wet etching to be patterned; a method for manufacturing the same; and a method for manufacturing a phase shift mask having a phase shift film capable of providing a phase shift effect enough. The phase shift mask black (1) is made by forming the phase shift film (3) including chrome, oxygen and nitrogen on a transparent substrate (2). On the phase shift film (3), a composition gradient area R1 is formed from the outermost surface (3a) in the depthwise direction of the film. In the composition gradient area R1, the maximum ratio (O/Cr) of oxygen to chrome decreasing from the outermost surface (3a) in the depthwise direction of the film is two or greater; and the maximum ratio of (N/Cr) of nitrogen to chrome decreasing from the outermost surface (3a) in the depthwise direction of the film is 0.45 or smaller.</p> |
