| 摘要 |
<p>Provided is a light irradiating apparatus, which irradiates a substrate with light to treat the substrate, comprising: a penetrating window which is penetrable by light; a dump which is sloped upwards in the direction to the outside direction of the penetrating window, installed at an upper portion of the penetrating window, and offsets reflected light which has reflected from the substrate and penetrated through the penetrating window; and a freezing block which circulates a coolant inside and is installed at the dump to cool the dump. Therefore, according to an embodiment of the present invention, a dump is sloped upwards in the outside direction of the penetrating window and has an uneven portion on the bottom surface to suppress or minimize diffuse reflection of the light reflected from a substrate, and also the reflected light is guided toward the outside direction of the penetrating window, so the reflected light can be prevented from going onto the penetrating window. a Mura generation and a light shift phenomenon, due to the temperature difference and the rise of the penetrating window, can thus be suppressed.</p> |
