WET ETCHING MATERIAL PREVENTING GLASS SLUDGE

摘要

The present invention relates to a wet etching material preventing glass sludge when etching a silicon oxide film formed on a glass substrate. The wet etching material preventing glass sludge according to the present invention includes 1-20 wt% of a hydrogen fluoride (HF), 5-40 wt% of ammonium fluoride (NH_4F), 0.01-5 wt% of an anionic additive, and deionized water.