发明名称 Lithographic tool in situ clean formulations
摘要 Compositions and methods of using said composition for removing polymeric materials from surfaces, preferably cleaning contaminant buildup from a lithography apparatus without total disassembly of said apparatus.
申请公布号 US9074169(B2) 申请公布日期 2015.07.07
申请号 US201013146438 申请日期 2010.01.26
申请人 ADVANCED TECHNOLOGY MATERIALS, INC. 发明人 Chen Tianniu;Bilodeau Steven;Boggs Karl E.;Jiang Ping;Korzenski Michael B.;Mirth George;Van Berkel Kim Y.
分类号 C11D11/00;C11D1/66;C11D3/43 主分类号 C11D11/00
代理机构 Moore & Van Allen, PLLC 代理人 Fuierer Tristan A.;Moore & Van Allen, PLLC ;Yaghmour Rosa
主权项 1. A composition comprising at least one organic solvent and at least one non-ionic surfactant, wherein the at least one non-ionic surfactant comprises a mixture of sorbitan ester and polysorbate surfactant and wherein the at least one organic solvent comprises a species selected from the group consisting of 3-pentanone, acetone, 5-hydroxy-2-pentanone, 4-hydroxy-4-methyl-2-pentanone, butanone, 2-methyl-2-butanone, 4-hydroxy-2-butanone, cyclopentanone, 2-pentanone, 1-phenylethanone, benzophenone, 2-hexanone, 3-hexanone, 2-heptanone, 4-heptanone, ethyl n-butyl ketone, ethyl n-amyl ketone, dicyclohexyl ketone, 2,6-dimethylcyclohexanone, 2-acetylcyclohexanone, dimethyl adipate, dimethyl succinate, diethyl phthalate, diethyl succinate, dibutyl succinate, diethyl adipate, diethyl glutarate, dibutyl phthalate, diethyl tartarate, butylene carbonate, glycerine carbonate, and combinations thereof.
地址 Danbury CT US