METHOD OF FABRICATING ARRAY SUBSTRATE

摘要

The present invention relates to a method for manufacturing an array substrate. The present invention provides the method for manufacturing the array substrate which includes the steps of: forming a semiconductor layer of polysilicon; forming a gate insulation layer; forming a first metal layer; forming a first photoresist pattern; forming a gate electrode; forming an ohmic region on the semiconductor layer of the polysilicon and forming a part corresponding to the photoresist pattern with the first width as an active region at the same time; forming a second width which is equal to the gate electrode by contracting the first width of the first photoresist pattern; exposing the gate electrode by removing the first photoresist pattern with the second width; and forming a preset layer of the active region exposed to the outside of the gate electrode as an LDD region; forming an interlayer dielectric layer; and forming a source electrode and a drain electrode which are separated.