发明名称 NITRIDE COATING LAYER AND THE METHOD THEREOF
摘要 A method for forming a nitride coating layer is disclosed. According to the present invention, the nitride coating layer, which is a plurality of TiAlSiN coating layers deposited on a substrate, has a concentration gradient for Si content in a plurality of TiAlSiN coating layers because a content of Si in the TiAlSiN coating layer near to the substrate in a thickness direction is less than a content of Si in the TiAlSiN coating layer relatively far from the substrate in the thickness direction.
申请公布号 KR20150076468(A) 申请公布日期 2015.07.07
申请号 KR20130164689 申请日期 2013.12.26
申请人 RESEARCH INSTITUTE OF INDUSTRIAL SCIENCE & TECHNOLOGY 发明人 YANG, JI HOON;JEONG, JAE IN
分类号 C23C14/34;C23C14/06 主分类号 C23C14/34
代理机构 代理人
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