| 发明名称 | Substrate treatment installation | ||
| 摘要 | A substrate treatment installation includes an installation chamber and a light source for the exposure of substrates to light. The light source is arranged in the interior of the substrate treatment installation and includes at least one discharge lamp arranged in a housing, which is permeable to light at least in sections and has a vacuum-tight cavity for accommodating the lamp, and also at least one reflector element arranged in spatial proximity to the at least one lamp and having an electrical connection. | ||
| 申请公布号 | US9076635(B2) | 申请公布日期 | 2015.07.07 |
| 申请号 | US201214113472 | 申请日期 | 2012.04.27 |
| 申请人 | VON ARDENNE Anlagentechnik GmbH | 发明人 | Gross Harald;Zschieschang Erwin |
| 分类号 | H01J1/02;H01J37/32;H01L21/67;H01J7/26 | 主分类号 | H01J1/02 |
| 代理机构 | Heslin Rothenberg Farley & Mesiti P.C. | 代理人 | Heslin Rothenberg Farley & Mesiti P.C. |
| 主权项 | 1. A substrate treatment installation, comprising an installation chamber and a light source for the exposure of substrates, wherein the light source is arranged inside the installation chamber and comprises at least one discharge lamp arranged in an at least locally optically transmissive housing having a vacuum-tight cavity for reception of the at least one discharge lamp, as well as at least one reflector element which has an electrical connection and is arranged in spatial proximity to the at least one discharge lamp. | ||
| 地址 | Dresden DE | ||