Replaceable upper chamber parts of plasma processing apparatus

摘要

An upper chamber section of a plasma reaction chamber includes a ceramic window with blind bores in an upper surface for receipt of a thermal couple and a resistance temperature detector, a top chamber interface which comprises an upper surface which vacuum seals against the bottom of the window and a gas injection system comprising 8 side injectors mounted in the sidewall of the top chamber interface and a gas delivery system comprising tubing which provides symmetric gas flow to the 8 injectors from a single gas feed connection.

主权项

1. A replaceable upper chamber part of a plasma reaction chamber in which semiconductor substrates can be processed, the chamber part comprising:
a removable gas delivery system received in an annular recess in an outer surface of a top chamber interface, the removable gas delivery system comprises bifurcated gas lines which receive tuning gas from a common feed and gas tubes arranged to flow the tuning gas equal distances from the common feed to injectors mounted in a side wall of the top chamber interface.