| 摘要 |
<p>Disclosed is a dual beam scanning electron microscope. It includes a sample analysis chamber, a sample stage for supporting a sample which is installed in the sample analysis chamber and is to be tested, an ion gun which is installed to the sample analysis chamber and emits an ion beam for manufacturing the cross section of the sample with the sample stage, a scanning electron unit which is connected to the sample analysis chamber and injects an electron beam to the sample, a shieling plate which is installed between the ion gun and a sample holing stage and determines the cross-section manufacturing point of a sampled located on the sample stage, a shielding plate position controller which supports the shielding plate and is installed to the stage in the sample analysis chamber for fine position control, a detector which detects the cross-section manufacturing state of a sample by an ion beam emitted from the ion gun, and a stage driving part which changes the posture and position of the sample stage between the cross-section manufacturing position vertical to the scanning direction of the sample stage and the ion beam and a cross-section monitoring position parallel to the scanning direction of the electron beam of the sample stage.</p> |
